Kurzfassung

Nanostructured surfaces attract much interest for optoelectronics, microfluidics, bioengineeringand general electronics applications. We provide a complete process for replication of nanos-tructures in silicon and other materials such as metals, polymers and glass by means of thermaland UV-Nanoimprint lithography.Nanoimprint lithography (NIL) is a convenient tool for the replication of nanostructures withmany possible patterns. For example, by using repetitive, pillar-shaped structures, the...Nanostructured surfaces attract much interest for optoelectronics, microfluidics, bioengineeringand general electronics applications. We provide a complete process for replication of nanos-tructures in silicon and other materials such as metals, polymers and glass by means of thermaland UV-Nanoimprint lithography.Nanoimprint lithography (NIL) is a convenient tool for the replication of nanostructures withmany possible patterns. For example, by using repetitive, pillar-shaped structures, the widelystudied lotus-effect gains part of its hydrophobic properties. NIL works using either temperature or light together with force. Using e-beam lithography, a masterstamp is produced containing the patterns, which is then pressed on a spun-on film of polymer onto a material of choice. By applying force and temperature (T-NIL) or force and light for curing(UV-NIL) the pattern is transferred to the polymer. Subsequent etching steps or additive processesallow the replicated pattern to be transferred into the desired material. FH KL is able to producea wide variety of patterns (e.g. Fig. 1 and 2) with feature sizes from micrometers down to 20nanometers with high aspect-ratios using NIL in polymer, glass, Si, SiO2, Ni and others.» weiterlesen» einklappen