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Nanostructuring of thin V2O3 films on Au(111) by sputtering

Poster. DPG Dresden. 2009

Erscheinungsjahr: 2009

Publikationstyp: Diverses (Konferenzbeitrag)

Sprache: Englisch

Inhaltszusammenfassung


Thin V2O3 films of approximately 1 - 100 ML thickness on Au(111) were prepared by evaporation of vanadium in an O2 atmosphere (p(O2)= 10-7 mbar). The films were characterized by LEED, Auger electron spectroscopy and photoelectron emission microscopy (PEEM). With annealing at T = 350 C epitaxial V2O3 films were found exhibiting (sqrt3 x sqrt3)R30 and (2x2) structures. Only after longer exposure to hydrogen (1-3 h) some reduction of the V2O3 film could be seen as evidenced by an increase of t...Thin V2O3 films of approximately 1 - 100 ML thickness on Au(111) were prepared by evaporation of vanadium in an O2 atmosphere (p(O2)= 10-7 mbar). The films were characterized by LEED, Auger electron spectroscopy and photoelectron emission microscopy (PEEM). With annealing at T = 350 C epitaxial V2O3 films were found exhibiting (sqrt3 x sqrt3)R30 and (2x2) structures. Only after longer exposure to hydrogen (1-3 h) some reduction of the V2O3 film could be seen as evidenced by an increase of the PEEM brightness corresponding to a work function decrease. Upon sputtering the film displayed some unexpected optical effects: depending on the angle of observation the films appeared red or green. Secondary electron microscopy (SEM) revealed that the sputtering has led to island formation on the surface. The islands exhibit an average diameter of 20 nm and an average separation from each other of 20 nm. As possible mechanisms causing the island formation selective sputtering and the transformation of the 2D layer V-oxide into a 3D layer are discussed.» weiterlesen» einklappen

Autoren


Lovis, Florian (Beteiligte Person)
Feldhoff, Armin (Beteiligte Person)
Imbihl, Ronald (Beteiligte Person)

Klassifikation


DFG Fachgebiet:
Physikalische Chemie

DDC Sachgruppe:
Physik

Verknüpfte Personen