Structural, magnetic and transport properties of Co2FeSi films
J. Phys. D: Appl. Phys. Bd. 40. 2007 S. 1548 - 1551
Erscheinungsjahr: 2007
ISBN/ISSN: 0022-3727
Publikationstyp: Zeitschriftenaufsatz (Forschungsbericht)
Sprache: Englisch
Doi/URN: 10.1088/0022-3727/40/6/S06
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Inhaltszusammenfassung
We report the deposition of thin Co2FeSi films by RF magnetron sputtering. Epitaxial (1 0 0)-oriented and L21 ordered growth is observed for films grown on MgO (1 0 0) substrates. (1 1 0)-oriented films on show several epitaxial domains in the film plane. Investigation of the magnetic properties reveals a saturation magnetization of 5.0 µB/fu at low temperatures. The temperature dependence of the resistivity ρxx(T) exhibits a crossover from a T3.5 law at T < 50 K to a T1.65 behaviour at elev...We report the deposition of thin Co2FeSi films by RF magnetron sputtering. Epitaxial (1 0 0)-oriented and L21 ordered growth is observed for films grown on MgO (1 0 0) substrates. (1 1 0)-oriented films on show several epitaxial domains in the film plane. Investigation of the magnetic properties reveals a saturation magnetization of 5.0 µB/fu at low temperatures. The temperature dependence of the resistivity ρxx(T) exhibits a crossover from a T3.5 law at T < 50 K to a T1.65 behaviour at elevated temperatures. ρxx(H) shows a small anisotropic magnetoresistive effect. A weak dependence of the normal Hall effect on the external magnetic field indicates the compensation of electron and hole like contributions at the Fermi surface.» weiterlesen» einklappen
Autoren
Klassifikation
DFG Fachgebiet:
Physik der kondensierten Materie
DDC Sachgruppe:
Physik