Interface magnetization of ultrathin epitaxial Co2FeSi(110)/Al2O3 films
Journal of physics : D, Applied physics. Bd. 40. H. 6. Bristol, UK: IOP Publ. 2007 S. 1552 - 1557
Erscheinungsjahr: 2007
ISBN/ISSN: 0022-3727 ; 1361-6463
Publikationstyp: Zeitschriftenaufsatz (Forschungsbericht)
Sprache: Englisch
Doi/URN: 10.1088/0022-3727/40/6/S07
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Inhaltszusammenfassung
Element-specific magnetic properties of ultrathin epitaxial Co2FeSi(110) films were measured using x-ray magnetic circular dichroism (XMCD). The epitaxial Heusler films were grown by RF magnetron sputtering on substrates. The magnetization of thicker films as determined by XMCD is smaller than expected for a half-metallic material. In addition, the magnetization decreases considerably for films thinner than 10 nm. The thickness dependence of the magnetic moment can be described by introducin...Element-specific magnetic properties of ultrathin epitaxial Co2FeSi(110) films were measured using x-ray magnetic circular dichroism (XMCD). The epitaxial Heusler films were grown by RF magnetron sputtering on substrates. The magnetization of thicker films as determined by XMCD is smaller than expected for a half-metallic material. In addition, the magnetization decreases considerably for films thinner than 10 nm. The thickness dependence of the magnetic moment can be described by introducing a certain number of dead layers representing a deficiency of magnetization at the interfaces. Quantitative evaluation results in a dead layer thickness of 0.8 nm at room temperature, consisting of a temperature induced size effect of 0.1 nm and a surface effect of 0.15 nm at the top and 0.55 nm at the bottom interface.» weiterlesen» einklappen
Autoren
Klassifikation
DFG Fachgebiet:
Physik der kondensierten Materie
DDC Sachgruppe:
Physik
Verknüpfte Personen
- Gerhard Jakob
- Mitarbeiter/in
(Johannes Gutenberg-Universität Mainz)
- Hans-Joachim Elmers
- Mitarbeiter/in
(Institut für Physik)